Purification of chlorosilanes

Details Purification of chlorosilanes Purification of chlorosilanes

1982-11-08

1984-11-06

Shaver, Paul F.

Chemistry of inorganic compounds

Silicon or compound thereof

Halogen containing

C01B 3308

Patent

active

044811780

ABSTRACT:
A method for the selective removal of phosphorus and other Lewis base-type impurities from chlorosilane solutions with selected transition metal compounds which react with the impurities and allow subsequent distillation of chlorosilane which is virtually free from contamination within extremely low limits of detectability.

REFERENCES:
patent: 3069239 (1962-12-01), Winter et al.

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