Purging system for diazotype film developer

Details Purging system for diazotype film developer Purging system for diazotype film developer

1975-08-14

1977-03-01

Braun, Fred L.

55 70, 34 79, G03D 700

Patent

active

040104788

ABSTRACT:
A purging system is provided for reducing and substantially eliminating contaminants, moisture, residual gas and the like from a work station such as, for example, a developer station in which ammonia gas is used for development of diazo type films. The system includes a check valve connected between one end of the developer station and a supply of compressed air, and a 3-way valve connected between the other end of the developer station and a supply of ammonia gas and an ammonia exhaust container. During development, the ammonia is passed into the developer station under a relatively high pressure and the flow of the ammonia is stopped by the check valve. After development, the pressure in the developer station is lowered thereby opening the check valve and causing flow of air from the supply of compressed air through the developer station, the 3-way valve, and into the exhaust container to thereby purge the entire system of contaminants, moisture and residual ammonia gas.

REFERENCES:
patent: 2431041 (1947-11-01), Hassler
patent: 2696771 (1954-12-01), Frantz
patent: 3323436 (1967-06-01), Hafer et al.
patent: 3720150 (1973-03-01), Hurtig et al.
patent: 3748995 (1973-07-01), Schroter et al.
patent: 3836987 (1974-09-01), Gibbons et al.

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