Purging gas from a photolithography enclosure between a mask...

Details Purging gas from a photolithography enclosure between a mask... Purging gas from a photolithography enclosure between a mask...

2007-08-14

2007-08-14

Nguyen, Henry Hung (Department: 2851)

Photocopying

Projection printing and copying cameras

Methods

C355S030000, C355S053000

Reexamination Certificate

active

10759641

ABSTRACT:
A method and apparatus are described for removing an initial gas from a gas-filled enclosure between the mask-protective device, such as a pellicle, and the patterned mask, such as a reticle, and adding a purge gas with a different composition. The gas-filled enclosure includes a vent for adding the purge gas to the chamber and removing the initial gas from the chamber. Adding and removing may be accomplished by using pressure, diffusion, vacuum, or other means.

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