Purge/charge manifold and method for cryogenic systems

Refrigeration – Processes – Assembling – charging – or repairing of refrigeration producer

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

62292, 141311R, 141348, G25B 4500

Patent

active

048844101

ABSTRACT:
A T-shaped manifold employs a single multiway control valve for purging and charging a cryogenic system of interest. The single multiway control valve is positioned at the intersection of a crossbar and perpendicular elongate member. One end of the crossbar is associated with a source of working gas. the opposite end of the crossbar provides a purge or check valve outlet. One end of the elongate member is connected to the multiway control valve and an opposite end is coupled by a VCO fitting to the cryogenic system of interest. At one setting, the single multiway control valve provides working gas to the system through the one end of the crossbar and elongate member. At a second setting, the multiway control valve allows gas to be vented from the system to ambient through the elongate member and the purge valve outlet. An in-line pressure gauge connected to the elongate member provides an indication of ingoing flow as well as outgoing flow of gas during respective charging and purging of the system. An in-line filter of the elongate member prevents particulate contamination of the flowing gases.

REFERENCES:
patent: 3996765 (1976-12-01), Mullins
Schematic drawing of a charging manifold and purge value (CTI-Cryogenics 8197004, May 1985).

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Purge/charge manifold and method for cryogenic systems does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Purge/charge manifold and method for cryogenic systems, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Purge/charge manifold and method for cryogenic systems will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2026945

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.