Purge cantilevered wafer loading system for LP CVD processes

Heating – Processes of heating or heater operation – Treating an article – container – batch or body as a unit

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432152, 432253, F27D 300

Patent

active

049766104

ABSTRACT:
A movable cantilevered purge system providing for a wafer load position, a wafer purge position, and a wafer process position. The movable cantilevered purge system includes an elephant carrier vehicle for movement of a movable quartz elephant tube. The movable quartz elephant tube includes a purge injector and a return exhaust tube. A cantilevered paddle clamping vehicle moves behind the movable quartz elephant carrier vehicle and holds a silicon carbide or ceramic paddle. The elephant carrier vehicle includes a quartz sealing ring and a stainless steel sealing ring carried on pivotable adjusting blocks, and are supported by a plurality of cylindrical tubes. The quartz sealing ring concentrically positions about the process tube of the furnace and a metal ring positions about a scavenger face. The return exhaust tube connects back into the scavenger area of the furnace. An alternative embodiment illustrates a configured bellows closure door at one end of a moveable stainless steel or quartz elephant tube which seals against a process tube of a wafer processing furnace and a configured bellow doors about one end of the cantilevered paddle for providing a pressure tight or vacuum tight environment for chemical vapor deposition (CVD) processes.

REFERENCES:
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patent: 4439146 (1984-03-01), Sugita
patent: 4459104 (1984-07-01), Wollmann
patent: 4518349 (1985-05-01), Tressler et al.
patent: 4543059 (1985-09-01), Whang et al.
patent: 4579523 (1986-04-01), Laiquddin et al.
patent: 4669938 (1987-06-01), Hayward
patent: 4767251 (1988-08-01), Whang

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