Pupil imaging reticle for photo steppers

Optics: measuring and testing – Lamp beam direction or pattern

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Details

356400, 356401, 250205, G01J 100, G01J 132, G01R 1100

Patent

active

059737719

ABSTRACT:
The invention relates to the evaluation of the pupil illumination profile in a projection lithography system using an imaging reticle featuring a plurality of holes of few microns in diameter. The imaging reticle is placed at the lens object plane and a photoresist coated substrate is exposed in a defocused position from the lithographic image plane. The image reticle has a plurality of identical holes that are regularly spaced at predetermined distances for a more detailed evaluation of the effective pupil illumination across the entire exposure field.

REFERENCES:
patent: 4000949 (1977-01-01), Watkins
patent: 5300967 (1994-04-01), Kamon
patent: 5420417 (1995-05-01), Shiraishi
patent: 5461456 (1995-10-01), Michalosk

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