Pumping system for RF excited gas devices

Details Pumping system for RF excited gas devices Pumping system for RF excited gas devices

1987-03-20

1988-05-31

Davie, James W.

Coherent light generators

Particular pumping means

Electrical

372 38, 315248, H01S 3097

Patent

active

047486341

ABSTRACT:
An RF excited gas discharge laser (10) is operated by an RF exciting power supply (12,14) having a frequency established at the selected pumping frequency of the laser. This pumping frequency is displaced from the resonant frequency of the laser itself and is provided via an impedance matching circuit (16) from the output of a high power amplifier (14) to which is fed the relatively low power output of the RF oscillator (12) of the power supply. The required starting voltage, of magnitude greater than the magnitude of the laser running voltage, is provided to ignite the laser by momentarily shifting the frequency of the RF oscillator to a frequency substantially the same as the resonant frequency of the laser and shifting the oscillator frequency back to its normal pumping frequency after laser ignition.

REFERENCES:
patent: 2531103 (1950-11-01), Beckwith
patent: 4169251 (1979-09-01), Laakmann
patent: 4383203 (1983-05-01), Stanley
patent: 4451766 (1984-05-01), Angle et al.
patent: 4631449 (1986-12-01), Peters, Jr.

Affiliated with

Also associated with

Rating

Pumping system for RF excited gas devices does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Pumping system for RF excited gas devices, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Pumping system for RF excited gas devices will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1879154