Pump, dispenser and corresponding process for dispensing a...

Dispensing – With discharge assistant – With discharge volume varying means

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C222S321500, C222S321900, C417S547000

Reexamination Certificate

active

07628294

ABSTRACT:
To improve sealing efficiency in a pump withdrawing liquid from a supply container (1) and to minimize the liquid residue in said container, the pump is designed to include a cylinder (5), a hollow plunger (6) configured within said cylinder, an external accessory pipe (7) configured at least partly within said plunger, and a feed pipe (8) configured at least partly within said external, accessory pipe, the internal feed pipe (8) being displaceable relative to the external accessory pipe (7) which in turn is displaceable relative to the hollow plunger (6).

REFERENCES:
patent: 1611601 (1926-12-01), McCall
patent: 1708834 (1929-04-01), Eldred
patent: 3239109 (1966-03-01), Santarelli
patent: 3749289 (1973-07-01), Levy
patent: 4842495 (1989-06-01), Howlett
patent: 5234134 (1993-08-01), Raab et al.
patent: 5975360 (1999-11-01), Ophardt
patent: 6196424 (2001-03-01), Bougamont et al.
patent: 2006/0065675 (2006-03-01), Bougamont et al.
patent: 39 28 521 (1991-03-01), None
patent: 0774074 (1997-05-01), None
patent: 0854685 (1998-07-01), None
patent: 10-324358 (1998-12-01), None

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Pump, dispenser and corresponding process for dispensing a... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Pump, dispenser and corresponding process for dispensing a..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Pump, dispenser and corresponding process for dispensing a... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-4145979

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.