Pulsed plasma apparatus and process

Details Pulsed plasma apparatus and process Pulsed plasma apparatus and process

1986-06-26

1990-06-19

Yusko, Donald J.

Electric lamp and discharge devices

Fluent material supply or flow directing means

Plasma

3133621, 31511121, 31511191, H01J 724

Patent

active

049356615

ABSTRACT:
An apparatus for pulsed plasma treatment of a substrate surface includes means for removing spent gas from a region adjacent the substrate for each pulse. The apparatus may also include means for sweeping an intense plasma region across a substrate surface. Rapid gas exchange is provided by pressure pulsing the gas admission. This facility also provides means for rapidly alternating different gases.

REFERENCES:
patent: 2883580 (1959-04-01), Kilpatrick
patent: 3988566 (1976-10-01), Vogts et al.
patent: 4645977 (1987-02-01), Kurokawa et al.

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