Pulsed laser microfabrication

Coating processes – Electrical product produced – Welding electrode

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219121L, B23K 900

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active

047524553

ABSTRACT:
A system and method of pulsed-laser microfabrication wherein a first substrate of transparent material, such as glass, has one or more target materials positioned on a surface, preferably a flat surface, of the substrate. These target materials include a thin film of electrically conductive material--i.e., a conductor or semiconductor--immediately adjacent to the substrate surface. Pulsed laser energy is directed through the transparent substrate onto the conductive film at a sufficient intensity and for a sufficient duration to rapidly vaporize the metal film. The target materials are driven by film vaporization energy and by the reaction thereof against the glass substrate onto the opposing or object surface of a second substrate.

REFERENCES:
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patent: 4190759 (1980-02-01), Hongo et al.
Roshon et al, "IBM Tech. Disc. Bull.", vol. 7, No. 3, p. 224, Aug. 1964.
von Gutfeld, "IBM Tech. Disc. Bull.", vol. 17, No. 6, pp. 1807-1808, Nov. 1974.
Coullahan et al, "IBM Tech. Disc. Bull.", vol. 22, No. 6, pp. 2279-2281, Nov. 1979.

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