Pulsed ion beam source

Details Pulsed ion beam source Pulsed ion beam source

1994-11-16

1996-06-11

Berman, Jack I.

Radiant energy

Ion generation

Field ionization type

31511141, H01J 2700

Patent

active

055258050

ABSTRACT:
An improved magnetically-confined anode plasma pulsed ion beam source. Beam rotation effects and power efficiency are improved by a magnetic design which places the separatrix between the fast field flux structure and the slow field structure near the anode of the ion beam source, by a gas port design which localizes the gas delivery into the gap between the fast coil and the anode, by a pre-ionizer ringing circuit connected to the fast coil, and by a bias field means which optimally adjusts the plasma formation position in the ion beam source.

REFERENCES:
patent: 4721889 (1988-07-01), Seidel et al.

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