Pulsed ion beam source

Details Pulsed ion beam source Pulsed ion beam source

1996-05-30

1997-08-12

Berman, Jack I.

Radiant energy

Ion generation

Field ionization type

31511141, H01J 2700

Patent

active

056568193

ABSTRACT:
An improved pulsed ion beam source having a new biasing circuit for the fast magnetic field. This circuit provides for an initial negative bias for the field created by the fast coils in the ion beam source which pre-ionize the gas in the source, ionize the gas and deliver the gas to the proper position in the accelerating gap between the anode and cathode assemblies in the ion beam source. The initial negative bias improves the interaction between the location of the nulls in the composite magnetic field in the ion beam source and the position of the gas for pre-ionization and ionization into the plasma as well as final positioning of the plasma in the accelerating gap. Improvements to the construction of the flux excluders in the anode assembly are also accomplished by fabricating them as layered structures with a high melting point, low conductivity material on the outsides with a high conductivity material in the center.

REFERENCES:
patent: 4707637 (1987-11-01), Harvey
patent: 4721889 (1988-01-01), Seidel et al.
patent: 5525805 (1996-06-01), Greenly

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