Electric lamp and discharge devices – Fluent material supply or flow directing means
Patent
1998-04-30
2000-04-11
Patel, Vip
Electric lamp and discharge devices
Fluent material supply or flow directing means
3133591, 3133601, 31511181, H01J 1726, H01J 6128
Patent
active
060491620
ABSTRACT:
In a pulsed electron beam source based on the vacuum principle, comprising a vacuum diode having a multi-point emission cathode with a flange and a plurality of emission points, a control grid, a pulse generator, a magnetic compression unit consisting of field coils, a drift chamber, a target chamber and a synchronization unit, the multipoint emission cathode is embedded in a shield electrode, and the shield electrode is connected to the cathode base by way of a resistor which is so sized that the shield electrode is capable of freely floating.
REFERENCES:
patent: 5841235 (1999-04-01), Engelko et al.
patent: 5897794 (1999-04-01), Hubbard et al.
G.O. Andrianov et al., "Sound-Velocity Anomalies in V.sub.2 O.sub.3 Crystals Grown by the Verneuil Method", Sov. Phys. Tech. 26, pp. 853-846. Jul., 1981.
V.I. Engelko et al., "Pulse Heat Treatment of Material Surface by High-Current Electron Beam", International Conference on High Power Particle Beams, 1992, pp. 1935-1941.
Kovalev et al., "Increasing the Energy of a Microsecond-Range Hollow Relativistic Electron Beam Generated by a Multitip Explosive-Emission Cathode", Soviet Technical Physics Letters, bD.14, nR. 6, Jun. 1988.
Engelko Vladimir
Kraft Gerd
Muller Georg
Schultheiss Christoph
Schumacher Gustav
Bach Klaus J.
Forschungszentrum Karlsruhe GmbH
Patel Vip
Smith Michael J.
LandOfFree
Pulsed electron beam source and its use does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Pulsed electron beam source and its use, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Pulsed electron beam source and its use will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1179137