Psoralens

Chemistry of carbon compounds – Miscellaneous organic carbon compounds – C-metal

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

260326D, 536 22, 424180, C07D49304

Patent

active

041245989

ABSTRACT:
New psoralen compounds have been synthesized. The compounds all include the addition of substituent groups at the 4' position on the basic trioxsalen structure. Specifically, the compounds have the structure: ##STR1## wherein X may be any desired substituent such as halogenated alkyls, alcohols, ethers, aminoalkyls, etc. The new substituted psoralens exhibit high solubility in aqueous solution and low dissociation constants from deoxyribonucleic acid (DNA), as well as a reactivity with ribonucleic acids (RNA). Such psoralen compounds find use in the study of secondary structures of nucleic acids; as inhibitors of RNA replication; in the inactivation of viruses; and in the photo chemotherapy of psoriasis.

REFERENCES:
patent: 3201421 (1965-08-01), Kaufman
Musajo et al., Chemical Abst., vol. 79, 1973, 27942b.
Ben-Hur et al., Chem. Abst., vol. 80, 1974 116713r.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Psoralens does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Psoralens, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Psoralens will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2233350

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.