PSM alignment method and device

Photocopying – Projection printing and copying cameras – Step and repeat

Reexamination Certificate

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Details

C355S067000, C355S071000, C378S034000, C250S492200

Reexamination Certificate

active

07411651

ABSTRACT:
The present invention relates to alignment of a writing system and a workpiece. In particular, it relates to alignment to write a second layer pattern on a workpiece that has a first layer pattern, using an SLM. It extends to producing a mask or reticle, and to producing a layer of a device using the mask or reticle. Particular aspects of the present invention are described in the claims, specification and drawings.

REFERENCES:
patent: 4734746 (1988-03-01), Ushida et al.
patent: 4812661 (1989-03-01), Owen
patent: 6285488 (2001-09-01), Sandstrom
patent: WO2005013006 (2005-02-01), None

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