Pseudo-random registration masks for projection lithography tool

Details Pseudo-random registration masks for projection lithography tool Pseudo-random registration masks for projection lithography tool

1995-06-06

1996-09-03

Berman, Jack I.

Radiant energy

Means to align or position an object relative to a source or...

H01J 37304

Patent

active

055526110

ABSTRACT:
An exposure mask for a particle beam projection system used in the manufacture of semiconductors includes pseudo-random mask alignment marks positioned on the exposure mask that match up with corresponding pseudo-random substrate alignment marks. The substrate alignment marks are made up of three repetitions of the pseudo-random code in the mask alignment marks formed as features on the substrate. The alignment marks act together to produce a backscattered alignment signal with an arbitrarily large capture distance, a single peak on a uniform background that makes it easy to detect the aligned position, a high signal to noise ratio and no false peaks that might lead to misalignment.

REFERENCES:
patent: 4363271 (1982-12-01), Horst
patent: 4370554 (1983-01-01), Bohlen et al.
patent: 4371264 (1983-02-01), Lacombat et al.
patent: 4590382 (1986-05-01), Tabata
Journal of Vacuum Science Technology, B 11(6) Nov./Dec. 1993, pp. 2175-2178, "Mark Detection for Alignment and Registration in a High-Throughput Projection Electron Lithography Tool", Farrow et al.

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