Proximity printing method

Details Proximity printing method Proximity printing method

1975-05-09

1977-05-31

Braun, Fred L.

Photocopying

Contact printing

Methods

355 76, 355 77, 355 91, G03B 2702

Patent

active

040266532

ABSTRACT:
A predetermined small spacing or gap between a semiconductor wafer and a mask is defined by projecting a cushion of air through a central mask aperture toward the wafer. The wafer is supported on a sponge rubber member which is designed, along with the air flow paths, to maintain a uniform small separation as is desirable in the photolithographic printing of semiconductor mask patterns.

REFERENCES:
patent: 1209419 (1916-12-01), Farguhar
patent: 3103850 (1963-09-01), Khoury et al.
patent: 3151521 (1964-10-01), Atkin et al.
patent: 3204544 (1965-09-01), Shannon
patent: 3519348 (1970-07-01), McLaughlin
patent: 3619056 (1971-11-01), Hantusch et al.
patent: 3676002 (1972-07-01), Moreau et al.
patent: 3741650 (1973-06-01), Leavitt et al.
patent: 3771872 (1973-11-01), Nightingale et al.
Schaible, P. M., "Dimension Control of Photolithographically Produced Patterns," I.B.M. Technical Disclosure Bulletin, vol. 8, No. 11, April 1966, p. 1575.

Affiliated with

Also associated with

Rating

Proximity printing method does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Proximity printing method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Proximity printing method will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-654954