Proximity laser doping technique for electronic materials

Details Proximity laser doping technique for electronic materials Proximity laser doping technique for electronic materials

1996-05-30

1999-02-16

King, Roy V.

Coating processes

Direct application of electrical, magnetic, wave, or...

Electromagnetic or particulate radiation utilized

427282, 438535, B05D 306

Patent

active

058718265

ABSTRACT:
This invention relates to a method of altering the electrical characteristics of a material through a laser ablation process. It can achieve high doping levels and shallow junctions at low temperatures, which are desirable in the fabrication of thin film transistors.

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