Proximity exposure method and machine therefor

Details Proximity exposure method and machine therefor Proximity exposure method and machine therefor

1994-02-10

1995-07-18

Gellner, M. L.

Photocopying

Projection printing and copying cameras

Detailed holder for original

355 53, G03F 720

Patent

active

054346487

ABSTRACT:
A proximity exposure method and apparatus therefor. Replications of mask patterns are carried out, wherein as a mask closely approaches a substrate, the displacement of the mask is detected, and the atmospheric pressure between the mask and the substrate, or around the side of the mask opposite the substrate is controlled so as to cancel the displacement of the mask. The apparatus includes positioning apparatus, a light source for exposing the mask pattern, displacement measuring means, and atmospheric pressure controlling means.

REFERENCES:
patent: 4854495 (1989-08-01), Yamamoto et al.
patent: 5168512 (1992-12-01), Iwamoto et al.
patent: 5291239 (1994-03-01), Jackson
J. Vac. Sci. Technol. B 11(6), Nov./Dec. 1993 pp. 2920-2925: Yanof. A. W., et al.; "X-ray mask membrane motion in narror gap lithography: Hydrodynamic model an exoeriment".

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