Proximity-dispensing high-throughput low-consumption resist coat

Details Proximity-dispensing high-throughput low-consumption resist coat Proximity-dispensing high-throughput low-consumption resist coat

1994-01-12

1996-11-05

Bell, Janyce

Coating processes

Centrifugal force utilized

427335, 427377, 4273855, 427422, 427425, 118 52, 118 64, 118305, 118313, 118314, 118320, B05D 312, B05C 1102

Patent

active

055715605

ABSTRACT:
A minimal amount of waste in liquid resist material is achieved by dispensing through small openings at close proximity to the substrate. An airtight substrate chamber as well as airtight sealing of dispensing assembly and airtight sealing of the space that does not have to be opened for substrate loading and unloading, are used to facilitate a uniform and planarized coating after a high-speed spin off of excess resist.

REFERENCES:
patent: 4347302 (1982-08-01), Gotman
patent: 4416213 (1983-11-01), Sakiya
patent: 5013586 (1991-05-01), Cavazza
patent: 5095848 (1992-03-01), Ikeno
patent: 5254367 (1993-10-01), Matsomura et al.
patent: 5366757 (1994-11-01), Lin
patent: 5378511 (1995-01-01), Cardinali et al.

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