Proximity correction dose modulation for E-beam projection litho

Details Proximity correction dose modulation for E-beam projection litho Proximity correction dose modulation for E-beam projection litho

1997-06-18

1999-02-02

Anderson, Bruce

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

H01J 3730

Patent

active

058669132

ABSTRACT:
A lithographic projection method which comprises projecting radiation along a transmission path and through a lens system and an opaque back focal plane filter for electrons with a transparent aperture for the projected radiation to produce a patterned image and an amount of desired radiation on a target. The transmission path includes a source of radiation of charged particles directed at a target comprising a substrate coated with resist. A pattern-defining mask that contains a plurality of subresolution scattering features thereon to produce the desired degree of scattering of the radiation is placed between the source and the target. The subresolution scattering features vary in density as an direct function of predicted proximity exposure.

REFERENCES:
patent: 4504558 (1985-03-01), Bohlen et al.
patent: 4712013 (1987-12-01), Nishimura et al.
patent: 4762396 (1988-08-01), Dumant et al.
patent: 4902899 (1990-02-01), Lin et al.
patent: 4957835 (1990-09-01), Aden
patent: 5097138 (1992-03-01), Wakabayashi et al.
patent: 5242770 (1993-09-01), Chen et al.
patent: 5256505 (1993-10-01), Chen et al.
patent: 5258246 (1993-11-01), Berger et al.
patent: 5359202 (1994-10-01), Yasuda et al.
patent: 5418093 (1995-05-01), Asai et al.
patent: 5424173 (1995-06-01), Wakabayashi et al.
patent: 5468577 (1995-11-01), Bae
patent: 5508133 (1996-04-01), Bae
patent: 5523184 (1996-06-01), Hwang et al.
patent: 5532496 (1996-07-01), Gaston
Ismail, "A Novel Method For Submicron Structurization Using Optical Projection Lithography"; Microelectronic Engineering 1 (1983) pp. 295-300.

Affiliated with

Also associated with

Rating

Proximity correction dose modulation for E-beam projection litho does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Proximity correction dose modulation for E-beam projection litho, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Proximity correction dose modulation for E-beam projection litho will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1119850