Protective mask for pellicle

Details Protective mask for pellicle Protective mask for pellicle

1994-09-22

1995-09-26

Wintercorn, Richard A.

Photocopying

Projection printing and copying cameras

Detailed holder for original

428 14, G03B 2762, D04D 706, D04D 710

Patent

active

054538165

ABSTRACT:
A protective mask is provided for use with a pellicle which is mounted to a photomask during photolithography, with a light source being directed toward the photomask. The pellicle includes a pellicle membrane mounted to a pellicle frame by a first adhesive layer and with the pellicle frame being mounted to the photomask by a second adhesive layer. The protective mask is fabricated of an opaque material and is positioned between the light source and the two adhesive layers to shield them from the light source.

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patent: 5370951 (1994-12-01), Kubota et al.
patent: 5378514 (1995-01-01), Hamada et al.

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