Protective inserts to line holes in parts for semiconductor...

Coating processes – Coating by vapor – gas – or smoke – Carbon or carbide coating

Reexamination Certificate

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Details

C427S237000, C427S249160, C427S402000, C427S419100

Reexamination Certificate

active

08034410

ABSTRACT:
Inserts are used to line openings in parts that form a semiconductor processing reactor. In some embodiments, the reactor parts delimit a reaction chamber. The reactor parts may be formed of graphite. A layer of silicon carbide is deposited on surfaces of the openings in the reactor parts and the inserts are placed in the openings. The inserts are provided with a hole, which can accept another reactor part such as a thermocouple. The insert protects the walls of the opening from abrasion caused by insertion of the other reactor part into the opening.

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Pending U.S. Appl. No. 11/856,418, filed Sep. 17, 2007, entitled “Semiconductor Processing Parts Having Apertures With Deposited Coatings and Methods for Forming the Same” in the name of Kuznetsov.

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