Apparel – Guard or protector – For wearer's head
Reexamination Certificate
2011-04-26
2011-04-26
Hurley, Shaun R (Department: 3765)
Apparel
Guard or protector
For wearer's head
C002S410000
Reexamination Certificate
active
07930771
ABSTRACT:
A protective helmet is described comprising: an outer layer (1); an inner layer (5) for contact with a head of a wearer; and an intermediate layer (3, 4) comprising an anisotropic cellular material comprising cells having cell walls, the anisotropic cellular material having a relatively low resistance against deformation resulting from tangential forces on the helmet. The anisotropic material can be a foam or honeycomb material. The foam is preferably a closed cell foam. The helmet allows tangential impacts to the helmet which cause less rotational acceleration or deceleration of the head of the wearer compared to helmets using isotropic foams while still absorbing a significant amount of rotational energy.
REFERENCES:
patent: 3174155 (1965-03-01), Pitman
patent: 3447163 (1969-06-01), Bothwell et al.
patent: 5561866 (1996-10-01), Ross
patent: 5637389 (1997-06-01), Colvin et al.
patent: 6183836 (2001-02-01), Pflug
patent: 6658671 (2003-12-01), Von Holst et al.
patent: 6726974 (2004-04-01), Pflug et al.
patent: 2002/0023291 (2002-02-01), Mendoza
patent: 2004/0117896 (2004-06-01), Madey et al.
patent: 2006/0148919 (2006-07-01), Maurer et al.
patent: 44 08 928 (1994-03-01), None
patent: 1 142 495 (2001-10-01), None
patent: 2 561 877 (1985-10-01), None
patent: WO 01/45526 (2001-06-01), None
patent: WO 2004/032659 (2004-04-01), None
Delye Hans
Depreitere Bart
Goffin Jan
Haex Bart
Van Audekercke Remy
Bacon & Thomas PLLC
Hurley Shaun R
K.U. Leuven Research & Development
Sutton Andrew W
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