Protective dust cover for photomask or reticle

Details Protective dust cover for photomask or reticle Protective dust cover for photomask or reticle

1991-07-22

1992-03-31

Schofer, Joseph L.

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

Mixing of two or more solid polymers; mixing of solid...

C08F 800

Patent

active

051009579

ABSTRACT:
A protective dust cover for a photomask or reticle useful for forming semiconductor integrated circuits, which is a transparent thin film cover to be disposed with a certain distance from the substrate surface of the photomask or reticle for the protection and dust proof of the substrate surface, said transparent thin film consisting essentially of a polyvinyl acetal of the formula: ##STR1## wherein R is a hydrogen atom, --CH.sub.3, --C.sub.2 H.sub.5 or --C.sub.n H.sub.m F.sub.2n-m+1 wherein n is an integer of from 1 to 8 and m is an integer of from 0 to 2n, x is a number of from 5 to 40, y is a number of from 0 to 10, z1 is a number of from 0 to 90/2, and z2 is a number of from 3/2 to 95/2, having a vinyl acetate content of at most 10 mol % and an acetal content of at least 60 mol %.

REFERENCES:
patent: 4413091 (1983-11-01), Iwasaki et al.
patent: 4665124 (1987-05-01), Walls et al.
patent: 4844828 (1989-07-01), Aoki

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