Protection layers in micromirror array devices

Details Protection layers in micromirror array devices Protection layers in micromirror array devices

2005-05-24

2008-12-02

Chen, Kin-Chan (Department: 1792)

Semiconductor device manufacturing: process

Chemical etching

Vapor phase etching

C438S700000

Reexamination Certificate

active

07459402

ABSTRACT:
To protect the structural layers from being eroded in the etching process, a protection layer is deposited on the exposed structural layers of the micromirror. The protection layer is deposited before etching and removed after etching.

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