Proportional variable resistor structures to electrically...

Details Proportional variable resistor structures to electrically... Proportional variable resistor structures to electrically...

2011-01-11

2011-01-11

Dole, Timothy J (Department: 2858)

Electricity: measuring and testing

Impedance, admittance or other quantities representative of...

Lumped type parameters

C324S695000, C033S645000

Reexamination Certificate

active

07868629

ABSTRACT:
A system, method and structures employing proportional variable resistors suitable for electrically measuring unidirectional misalignment of stitched masks in etched interconnect layers. In an example embodiment, there is a structure (10, 20) that comprises at least one proportional variable resistor (24) suitable for electrically measuring unidirectional misalignment of stitched masks in etched interconnect layers. The structure (10,20) comprises at least a first mask (10) and a second mask (20) that when superimposed comprise at least two test pads (14, 16) and interconnects (12, 22) the resistance between (24) which can be measured.

REFERENCES:
patent: 3808527 (1974-04-01), Thomas
patent: 4153998 (1979-05-01), McMurtry
patent: 4386459 (1983-06-01), Boulin
patent: 4437760 (1984-03-01), Ausschnitt
patent: 4571538 (1986-02-01), Chow
patent: 6393714 (2002-05-01), Look et al.

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