Propiophenone derivatives as photoinitiators for photopolymeriza

Details Propiophenone derivatives as photoinitiators for photopolymeriza Propiophenone derivatives as photoinitiators for photopolymeriza

1986-06-30

1989-01-03

Bleutge, John C.

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

Compositions to be polymerized by wave energy wherein said...

522 34, 522 42, 522121, 549342, 549450, C07D31726, C07D31772, C08F 250, C08F 400

Patent

active

047957662

ABSTRACT:
Propiophenones of the formula I ##STR1## in which R.sup.1 is hydrogen or C.sub.1 -C.sub.4 -alkyl, --Si(CH.sub.3).sub.3, allyl or benzyl, R.sup.2 is hydrogen, C.sub.1 -C.sub.8 -alkyl, C.sub.1 -C.sub.4 -alkyl which is substituted by C.sub.1 -C.sub.4 -alkoxy or --OH, --(CH.sub.2 --CH.sub.2 --O).sub.n --R.sup.5 where n is 2 to 20 and R.sup.5 is H or C.sub.1 -C.sub.4 -alkyl, --Si(CH.sub.3).sub.3, benzyl, C.sub.3 -C.sub.6 -alkenyl, C.sub.3 -C.sub.4 -alkynyl or 2-tetrahydrofuranyl, or R.sup.1 and R.sup.2 together are a C.sub.1 -C.sub.6 -alkylidene radical or a C.sub.2 -C.sub.6 -alkylidene radical which is substituted by hydroxyl, C.sub.1 -C.sub.4 -alkoxy or phenyl, a linear or branched C.sub.2 -C.sub.6 -alkanediyl radical, a benzylidene, cyclopentylidene or cyclohexylidene radical or a 2,2,2-trichloroethylidene, 2-furylimethylidene or dimethylsilylidene radical, R.sup.3 is phenyl which is unsubstituted or substituted by one or more --Cl, C.sub.1 -C.sub.4 -alkyl, C.sub.1 -C.sub.4 -alkoxy or C.sub.1 -C.sub.4 -alkylthio radicals, and is also benzoylphenyl, phenoxyphenyl or phenylthiophenyl, R.sup.4 is C.sub.1 -C.sub.4 -alkyl, or phenyl which is unsubstituted or substituted by one or more --Cl, C.sub.1 -C.sub.4 -alkyl or C.sub.1 -C.sub.4 -alkoxy radicals, and R.sup.5 is hydrogen or C.sub.1 -C.sub.4 -alkyl, or R.sup.4 and R.sup.5 together are a trimethylene or tetramethylene radical, and R.sup.6 is hydrogen, C.sub.1 -C.sub.4 -alkyl, --CCl.sub.3 or phenyl, subject to the condition that, if R.sup.2, R.sup.5 and R.sup.6 at the same time are hydrogen and R.sup.3 and R.sup.4 ar at the same time phenyl, R.sup.1 must not be hydrogen or C.sub.1 -C.sub.4 -alkyl, also, if R.sup.3 and R.sup.4 at the same time are phenyl and R.sup.5 and R.sup.6 are at the same time hydrogen, R.sup.1 and R.sup.2 together must not be alkylidene or benzylidene, and also, if R.sup.3 and R.sup.4 at the same time are p-methoxyphenyl and R.sup.2, R.sup.5 and R.sup.6 are at the same time hydrogen, R.sup.1 must not be hydrogen, and, finally, if R.sup.2 and R.sup.5 at the same time are hydrogen and R.sup.3, R.sup.4 and R.sup.6 are at the same time phenyl, R.sup.1 must not be hydrogen, are valuable initiators for the photopolymerization of ethylenically unsaturated compounds.

REFERENCES:
patent: 3344148 (1967-09-01), Dietrich et al.
patent: 3607693 (1971-09-01), Heine et al.
patent: 3801329 (1974-04-01), Sandner et al.
patent: 3944509 (1976-03-01), Adams
patent: 4072694 (1978-02-01), Brattesani
patent: 4144156 (1979-03-01), Kuesters et al.
patent: 4318791 (1982-03-01), Felder et al.
Roffey "Photopolymerization of Surface Coatings" Wiley & Sons, 1982, pp. 79-84.

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