Projection type exposure apparatus and method with detachable an

Details Projection type exposure apparatus and method with detachable an Projection type exposure apparatus and method with detachable an

1995-11-03

1997-06-10

Epps, Georgia Y.

Optical: systems and elements

Lens

With support

359821, 359823, G02B 0702

Patent

active

056382235

ABSTRACT:
A projection type exposure apparatus is provided for illuminating a mask formed with a pattern with an illumination light having a predetermined wavelength area and forming an image of the pattern on a substrate through a projection optical system. This apparatus comprises a projection optical system incorporating a plurality of lens barrel units each housing one or more optical elements. Each lens barrel unit is so mounted in the projection optical system as to be attachable thereto and detachable therefrom.

REFERENCES:
patent: 2794360 (1957-06-01), Eagle
patent: 4666273 (1987-05-01), Shimizu et al.
patent: 4690528 (1987-09-01), Tanimoto
patent: 5077569 (1991-12-01), Notagashira
patent: 5117255 (1992-05-01), Shiraishi et al.
patent: 5500772 (1996-03-01), Ishii
patent: 5526194 (1996-06-01), Ruffell

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