Optical: systems and elements – Lens – With support
Patent
1995-11-03
1997-06-10
Epps, Georgia Y.
Optical: systems and elements
Lens
With support
359821, 359823, G02B 0702
Patent
active
056382235
ABSTRACT:
A projection type exposure apparatus is provided for illuminating a mask formed with a pattern with an illumination light having a predetermined wavelength area and forming an image of the pattern on a substrate through a projection optical system. This apparatus comprises a projection optical system incorporating a plurality of lens barrel units each housing one or more optical elements. Each lens barrel unit is so mounted in the projection optical system as to be attachable thereto and detachable therefrom.
REFERENCES:
patent: 2794360 (1957-06-01), Eagle
patent: 4666273 (1987-05-01), Shimizu et al.
patent: 4690528 (1987-09-01), Tanimoto
patent: 5077569 (1991-12-01), Notagashira
patent: 5117255 (1992-05-01), Shiraishi et al.
patent: 5500772 (1996-03-01), Ishii
patent: 5526194 (1996-06-01), Ruffell
Epps Georgia Y.
Mack Ricky
Nikon Corporation
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