Optics: measuring and testing – By alignment in lateral direction – With registration indicia
Patent
1985-11-12
1987-12-01
Rosenberger, R. A.
Optics: measuring and testing
By alignment in lateral direction
With registration indicia
G01B 1100
Patent
active
047100290
ABSTRACT:
A projection type exposing apparatus includes a projection objective for projecting the image of a reticle having a predetermined pattern and a plurality of alignment marks onto a wafer, photoelectric alignment means having an imaging optical system for forming the images of the alignment marks on the reticle, a photoelectric detecting slit member disposed at a predetermined image position of the imaging optical system, and a slit image displacing optical member disposed in the optical path of the imaging optical system to optically displace the image position of the slit member on the reticle in a direction perpendicular to the lengthwise direction of the slit member, the slit member being designed such that the lengthwise direction thereof is coincident with a straight line intersecting the optic axis of the projection objective on the reticle, a movable stage for supporting the wafer thereon for movement relative to the projection objective, and a reference index mark member provided on the movable stage to set the reference position of the slit member in the photoelectric alignment means relative to the movable stage.
REFERENCES:
patent: 4167677 (1979-09-01), Suzki
patent: 4362389 (1982-12-01), Koizumi et al.
patent: 4492459 (1985-01-01), Omata
Nippon Kogaku K. K.
Rosenberger R. A.
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