Optics: measuring and testing – By alignment in lateral direction – With registration indicia
Patent
1986-08-29
1989-01-31
Rosenberger, Richard A.
Optics: measuring and testing
By alignment in lateral direction
With registration indicia
250548, G01B 1127
Patent
active
048012084
ABSTRACT:
Alignment of a mask with a projection-type exposing apparatus and alignment of the mask with a substrate are provided. Plural exposure areas of the substrate are exposed by light of a predetermined wavelength, which is also used for alignment purposes to reduce alignment error due to aberration of a projection optical system. A first alignment mark is disposed in a first area between adjacent exposure areas of the substrate. The mask has a main area, a second area in which a second mark is disposed, and a third area in which a third mark is disposed, the second area being outside of the main area and the third area being inside the second area. An illuminating device has a first status in which the second and third areas are illuminated simultaneously and has a second status in which the third area is illuminated, a first area adjacent to one of the exposure areas also being illuminated when the illuminating device has the second status. In the first status, a first detector detects the position of an image of the second mark formed by an objective optical system. In the second status, a second detector detects displacement between images of the first and third marks formed by the objective optical system and produces a detection signal. The mask is displaced relative to the substrate in response to the detection signal, so that the images of the first and third marks assume a predetermined relationship.
REFERENCES:
patent: 4251129 (1981-02-01), Suzki et al.
patent: 4362389 (1982-12-01), Koizumi et al.
patent: 4655599 (1987-04-01), Ayata et al.
Katoh Kinya
Matsuura Toshio
Nikon Corporation
Rosenberger Richard A.
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