Optical: systems and elements – Lens – With support
Patent
1998-12-21
2000-11-14
Mack, Ricky
Optical: systems and elements
Lens
With support
359822, 359813, G02B 702
Patent
active
061478180
ABSTRACT:
A projection optics box or assembly for use in an optical assembly, such as in an extreme ultraviolet lithography (EUVL) system using 10-14 nm soft x-ray photons. The projection optics box utilizes a plurality of highly reflective optics or mirrors, each mounted on a precision actuator, and which reflects an optical image, such as from a mask, in the EUVL system onto a point of use, such as a target or silicon wafer, the mask, for example, receiving an optical signal from a source assembly, such as a developed from laser system, via a series of highly reflective mirrors of the EUVL system. The plurality of highly reflective optics or mirrors are mounted in a housing assembly comprised of a series of bulkheads having wall members secured together to form a unit construction of maximum rigidity. Due to the precision actuators, the mirrors must be positioned precisely and remotely in tip, tilt, and piston (three degrees of freedom), while also providing exact constraint.
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Hale Layton C.
Hudyma Russell M.
Malsbury Terry
Parker John M.
Carnahan L. E.
Mack Ricky
The Regents of the University of California
Thompson Alan H.
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