Projection-optical system for use in a projection-exposure appar

Optical: systems and elements – Lens – Multiple component lenses

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

359756, G02B9/62

Patent

active

059034009

ABSTRACT:
Projection-optical systems are disclosed for projecting an image of a first object M onto a second object P. Each such projection-optical system comprises, in order from the first-object side: a positive first lens group; a negative second lens group comprising a pair of negative lens elements forming a pair of concave surfaces facing each other; a positive third lens group comprising a lens element, positioned nearest the second object within the third lens group, having a concave surface facing the second object; an aperture stop; a positive fourth lens group comprising a lens element, positioned nearest the first object within the fourth lens group, having a concave surface facing the first object; a negative fifth lens group comprising a pair of negative lens elements that form a pair of concave surfaces facing each other; and a positive sixth lens group. The projection-optical systems satisfy any of several quantitative conditions.

REFERENCES:
patent: 3504961 (1970-04-01), Hoogland et al.
patent: 3897138 (1975-07-01), Kano
patent: 3909115 (1975-09-01), Kano
patent: 4497015 (1985-01-01), Konno et al.
patent: 4666273 (1987-05-01), Shimizu et al.
patent: 4770477 (1988-09-01), Shafer
patent: 4772107 (1988-09-01), Friedman
patent: 4811055 (1989-03-01), Hirose
patent: 4891663 (1990-01-01), Hirose
patent: 4918583 (1990-04-01), Kudo et al.
patent: 5105075 (1992-04-01), Ohta et al.
patent: 5170207 (1992-12-01), Tezuka et al.
patent: 5172275 (1992-12-01), DeJager
patent: 5245384 (1993-09-01), Mori
patent: 5260832 (1993-11-01), Togino et al.
patent: 5448408 (1995-09-01), Togini et al.
patent: 5696631 (1997-12-01), Hoffman
Braat, "Quality of Microlithographic Projection Lenses," SPIE 811:22-30 (1987).

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Projection-optical system for use in a projection-exposure appar does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Projection-optical system for use in a projection-exposure appar, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Projection-optical system for use in a projection-exposure appar will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-249788

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.