Projection optical system, exposure system provided with the...

Optical: systems and elements – Lens – With field curvature shaping

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C359S651000, C349S005000

Reexamination Certificate

active

06844982

ABSTRACT:
A projection optical system includes a plurality of light-transmissive members and projects an image of a first surface onto a second surface. The projection optical system includes a light-transmissive crystal member made of crystal material. At least one of the light-transmissive crystal members satisfiesin-line-formulae description="In-line Formulae" end="lead"?0.3<ED/LD<0.95in-line-formulae description="In-line Formulae" end="tail"?Where an clear aperture diameter of the light-transmissive crystal member is denoted by ED and an outside diameter of the light-transmissive crystal member is denoted by LD.

REFERENCES:
patent: 6097546 (2000-08-01), Yoshii et al.
patent: 6137626 (2000-10-01), Takaoka
patent: 6201634 (2001-03-01), Sakuma et al.
patent: 6239924 (2001-05-01), Watson et al.
patent: 6366404 (2002-04-01), Hiraiwa et al.
patent: 6400516 (2002-06-01), Spinali
patent: 20030000453 (2003-01-01), Unno et al.
patent: 20030011893 (2003-01-01), Shiraishi et al.
patent: 20030011896 (2003-01-01), Shiraishi
patent: 20030012724 (2003-01-01), Burnett et al.
patent: 20030021026 (2003-01-01), Allan et al.
patent: 20030025894 (2003-02-01), Owa et al.
patent: 20030086171 (2003-02-01), McGuire, Jr.
patent: 20030053036 (2003-03-01), Fujishima et al.
patent: 20030058421 (2003-03-01), Omura et al.
patent: 20030086071 (2003-05-01), McGuire, Jr.
patent: 20030086156 (2003-05-01), McGuire, Jr.
patent: 20030086157 (2003-05-01), McGuire, Jr.
patent: 20030099047 (2003-05-01), Hoffman et al.
patent: 20030137733 (2003-07-01), Gerhard et al.
patent: 1 114 802 (2001-07-01), None
patent: A 8-107060 (1996-04-01), None
patent: A 11-54411 (1999-02-01), None
patent: A 2000-331927 (2000-11-01), None
patent: A 2001-76992 (2001-03-01), None
patent: A 2001-284226 (2001-10-01), None
patent: WO 02093209 (2002-11-01), None
patent: WO 02093257 (2002-11-01), None
patent: WO 03009021 (2003-01-01), None
patent: WO 03009062 (2003-01-01), None
patent: WO 03077007 (2003-09-01), None
patent: WO 03077011 (2003-09-01), None
Burnett et al., “Intrinsic Birefringence in 157 nm Materials,” 2ndInternational Symposium on 157 nm Lithography on May 15, 2001.
Nattermann et al., “Birefringence of CaF2,” International SEMATECH Calcium Fluoride Birefringence Work Shop on Jul. 2001.
Burnett et al., “Intrinsic birefringence in calcium fluoride and barium fluoride,” Physical Review B, vol. 64 241102(R), Nov. 29, 2002.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Projection optical system, exposure system provided with the... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Projection optical system, exposure system provided with the..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Projection optical system, exposure system provided with the... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3411782

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.