Projection optical system, exposure apparatus and semiconductor-

Details Projection optical system, exposure apparatus and semiconductor- Projection optical system, exposure apparatus and semiconductor-

1997-07-31

1999-09-14

Lee, Eddie C.

Photocopying

Projection printing and copying cameras

Focus or magnification control

355 53, 25037015, G03B 2752, G03B 2742, G01J 124

Patent

active

059531061

ABSTRACT:
A projection optical apparatus includes a projection optical system including lenses, a measurement unit for measuring a change in the shape of one of the lenses, and an adjustment unit for adjusting the optical characteristics of the projection optical system in accordance with a signal from the measurement unit. Since a change in the shape of the lens due to a thermal change of the lens is directly measured and optical characteristics of the projection optical system are adjusted in accordance with the result of the measurement, projection can be performed with high stability and precision.

REFERENCES:
patent: 4825247 (1989-04-01), Kemi et al.
patent: 4920505 (1990-04-01), Suzuki
patent: 4998821 (1991-03-01), Ohta et al.
patent: 5137349 (1992-08-01), Taniguchi
patent: 5337097 (1994-08-01), Suzuki et al.

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