Projection optical system, exposure apparatus, and method of...

Details Projection optical system, exposure apparatus, and method of... Projection optical system, exposure apparatus, and method of...

2008-09-22

2010-06-29

Spector, David N (Department: 2873)

Optical: systems and elements

Lens

With field curvature shaping

C355S053000, C355S067000, C355S071000, C359S740000

Reexamination Certificate

active

07746561

ABSTRACT:
A projection optical system which projects an image of a first object onto a second object includes a plurality of lenses and a plurality of aperture stops for determining a numerical aperture. The plurality of aperture stops include a first aperture stop having an opening whose size can be changed, and a second aperture stop having an opening whose size can be changed. The first and second aperture stops are positioned nearer to the second object than a lens having the maximum effective diameter among the lenses included in an imaging optical system nearest to the second object. At least one of the first and second aperture stops is positioned at or near the pupil of the imaging optical system. The range of the numerical aperture determined by the first aperture stop is larger than the range of the numerical aperture determined by the second aperture stop.

REFERENCES:
patent: 5363172 (1994-11-01), Tokuda
patent: 5592329 (1997-01-01), Ishiyama et al.
patent: 7023953 (2006-04-01), Komatsuda
patent: 7295285 (2007-11-01), Hiura
patent: 7310131 (2007-12-01), Jasper
patent: 02-148011 (1990-06-01), None
patent: 3690819 (1994-08-01), None
patent: 2002-118053 (2002-04-01), None
patent: 2007-043168 (2007-02-01), None

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