Projection optical system, exposure apparatus, and exposure...

Optical: systems and elements – Lens – With field curvature shaping

Reexamination Certificate

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Reexamination Certificate

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07457042

ABSTRACT:
A projection optical system which uses, for example, an ArF excimer laser beam and can ensure a good imaging performance for an extended period while avoiding the variations in refractive index and the effect of the intrinsic double refraction of a fluorite containing a high-frequency component. A projection optical system for forming the demagnified image of a first plane (R) on a second plane (W). A first light transmitting member (L23) disposed closest to the second plane side and having almost no refraction power is provided. When the distance between the first light transmitting member and the second plane is WD, a numerical aperture on the second plane side NA, and the center wavelength of a light used L×10−6, the condition 0.06<WDNA/L<0.23 is satisfied. Or, a first light transmitting member disposed closest to a second plane side and having almost no refraction power, and a second light transmitting member (L22) disposed adjacent to the first plane side are provided. When an air-equivalent length from the second light transmitting member to the second plane is OD, the condition 0.1<ODNA/L<0.4 is satisfied.

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patent: WO 01/50171 (2001-07-01), None

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