Projection optical system, exposure apparatus and exposure...

Details Projection optical system, exposure apparatus and exposure... Projection optical system, exposure apparatus and exposure...

2005-06-21

2005-06-21

Nguyen, Henry Hung (Department: 2851)

Photocopying

Projection printing and copying cameras

Illumination systems or details

C355S053000

Reexamination Certificate

active

06909492

ABSTRACT:
Disclosed is a projection optical system having relatively large image-side numerical aperture and projection field and being excellent in mechanical stability in respect of vibrations, and the like. The projection optical system includes a first image-forming optical system for forming a first intermediate image of a first surface (R), a second image-forming optical system having a concave reflective mirror and for forming a second intermediate image based on a radiation beam from the first intermediate image, and a third image-forming optical system for forming a final image on a second surface based on a radiation beam from the second intermediate image. Then, predetermined conditional expressions are satisfied with regard to a clear aperture diameter of the concave reflective mirror, a distance (L) between the first surface and the second surface, and a distance (H) between the concave reflective mirror and a reference optical axis.

REFERENCES:
patent: 3574459 (1971-04-01), Hartwig et al.
patent: 4678321 (1987-07-01), Inokuchi
patent: 4736225 (1988-04-01), Tanaka et al.
patent: 5861997 (1999-01-01), Takahashi
patent: 6512631 (2003-01-01), Shafer et al.
patent: 2003/0011755 (2003-01-01), Omura et al.

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