Projection optical system, exposure apparatus and device...

Photocopying – Projection printing and copying cameras – Illumination systems or details

Reexamination Certificate

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C355S077000, C355S053000, C359S256000

Reexamination Certificate

active

07057708

ABSTRACT:
A projection optical system includes a first optical element that orients an axis [1 1 1] as a crystal orientation in a cubic system crystal parallel to an optical axis, and a second optical element that orients an axis [1 0 0] as the crystal orientation in the cubic system crystal so that a minimum angle may be 30° or larger between the optical axis and an off-axis edge beam that passes through the second optical element, and a minimum angle may be 10° or smaller between the optical axis and an off-axis principal ray that passes through the second optical element.

REFERENCES:
patent: 2003/0000453 (2003-01-01), Unno et al.
patent: 2004/0105170 (2004-06-01), Krahmer et al.
patent: WO 03/009021 (2003-01-01), None
patent: WO 03/009062 (2003-01-01), None
European Patent Office, International Search Report dated Oct. 22, 2003 of PCT International Application No. PCT/JP03/08784, Filed Jul. 10, 2003.
John H. Burnett et al., “Intrinsic Birefringence in 157 nm Materials,” Proceedings of the International Symposium on 157 nm Lithography, National Institute of Standards and Technology, pp. 1-13, May 15, 2001.
John H. Burnett et al., “Minimizing Spatial Dispersion Induced Birefringence in Crystals Used for Precision Optics by Using Mixed Crystals of Materials with the Opposite Sign of Birefringence,” National Institute of Standards and Technology, pp. 1-2, Jul. 12, 2001.
John H. Burnett et al., “Intrinsic Birefringence in Calcium Fluoride and Barium Fluoride,” Physical Review B, vol. 64, No. 24, American Institute of Physics., New York, U.S., pp. 241102-1-241102-4, Dec. 15, 2001.

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