Projection optical system, exposure apparatus and device...

Details Projection optical system, exposure apparatus and device... Projection optical system, exposure apparatus and device...

2008-01-29

2008-01-29

Pritchett, Joshua L (Department: 2872)

Optical: systems and elements

Compound lens system

With curved reflective imaging element

C359S859000, C359S861000

Reexamination Certificate

active

11549991

ABSTRACT:
A projection optical system is provided for projecting a pattern on an object plane onto an image plane in a reduced size. The projection optical system has six reflective surfaces that include, in order of reflecting light from the object plane, a first reflective surface, a second convex reflective surface, a third convex reflective surface, a fourth reflective surface, a fifth reflective surface and a sixth reflective surface. An aperture stop is provided along an optical path between the first and second reflective surfaces. The following condition is met by the system, where L1is an interval between the object plane and the surface apex that is the closest to the object plane, and L2is an interval between the surface apex of the first reflective surface and the surface apex that is the closest to the object plane:0.75<L⁢⁢1L⁢⁢2<1.25.

REFERENCES:
patent: 6033079 (2000-03-01), Hudyma
patent: 6172825 (2001-01-01), Takahashi
patent: 2003/0076483 (2003-04-01), Komatsuda
patent: 2003/0147131 (2003-08-01), Terasawa
patent: 2001-185480 (2001-07-01), None
patent: 2002-006221 (2002-01-01), None
patent: 2003-015040 (2003-01-01), None
patent: WO 02/48796 (2002-06-01), None
patent: WO 03/005097 (2003-01-01), None

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