Optical: systems and elements – Diffraction – From grating
Patent
1995-06-29
1998-05-19
Dzierzynski, Paul M.
Optical: systems and elements
Diffraction
From grating
359355, 359565, 359350, G02B 518, G02B 2744, G02B 1314
Patent
active
057543402
ABSTRACT:
The projection optical system of the present invention decreases particularly the secondary spectrum of chromatic aberration and minimizes restrictions on lens design. The projection optical system of a projection exposure apparatus which irradiates a light beam from a light source on a mask to expose a pattern of the mask onto a photosensitive substrate through the projection optical system has at least one diffraction optical element, at least one quartz lens, and at least one fluorite lens. The diffraction optical element has a positive power, the quartz lens has a negative power, and the fluorite lens has a positive power. An Ar--F laser is preferably used as a light source.
REFERENCES:
patent: 5046838 (1991-09-01), Iwasaki
patent: 5121255 (1992-06-01), Hayshi
patent: 5170207 (1992-12-01), Tezuka et al.
patent: 5386319 (1995-01-01), Whitney
patent: 5623365 (1997-04-01), Kuba
Miyaji et al. tutorial review "Excimer Lithography for ULSI" in Optical and Quantum Electronics 25 (1993) 297-310.
Nishida "Achromatic Lens by Combining Diffraction Grating and Refractive Lenses" extracted from Shashin Kogyo, Mar. 1994.
Matsumoto Koichi
Ushida Kazuo
Chang Audrey
Dzierzynski Paul M.
Nikon Corporation
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