Projection optical system and projection exposure apparatus

Details Projection optical system and projection exposure apparatus Projection optical system and projection exposure apparatus

1996-10-11

1998-09-08

Sugarman, Scott J.

Optical: systems and elements

Lens

With field curvature shaping

359651, 359663, 359754, G02B 1304, G02B 1322

Patent

active

058053441

ABSTRACT:
In the projection optical system that projects an image of the first object onto the second object with a fixed reduction ratio and a projection aligner equipped therewith, said projection optical system comprises, viewed from said first object side, in order of succession, the first group of lenses with positive refractive power, and the second group of lenses virtually consists of afocal system, and the third group of lens with positive refractive power, and if the focal length of the overall system is represented by F, the projection magnification ratio of said projection optical system is represented by B, the distance between said first object and said second object is represented by L, and when a ray from the second object side of said projection optical system that is parallel to the optical axis of said projection optical system is incident on said projection optical system, a distance between a point where an extension on the first object side of said ray intercepts the optical axis and said first object plane is represented by e, and a height of said ray on said first object from the optical axis of said projection optical system, when said ray, coming through said projection optical system, reaches said first object is represented by h, then the following conditions should be satisfied:

REFERENCES:
patent: 4386828 (1983-06-01), Hirose
patent: 4592625 (1986-06-01), Uehara et al.
patent: 5260832 (1993-11-01), Togino et al.
patent: 5448408 (1995-09-01), Togino et al.

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