Optical: systems and elements – Lens – With field curvature shaping
Reexamination Certificate
2007-07-03
2007-07-03
Schwartz, Jordan M. (Department: 2873)
Optical: systems and elements
Lens
With field curvature shaping
C359S726000, C359S727000
Reexamination Certificate
active
11473128
ABSTRACT:
A catadioptric projection optical system includes a first optical system, for receiving light from an object, a second optical system, for forming an image of the object on an image plane, and a third optical system disposed optically between the first optical system and the second optical system. The first, second and third optical systems have a common straight optical axis. The image of the object is projected onto the image plane through a plurality of real intermediate image formations, and a pupil plane of the catadioptric projection optical system is free of a void area.
REFERENCES:
patent: 4241390 (1980-12-01), Markle et al.
patent: 4747678 (1988-05-01), Shafer et al.
patent: 4757354 (1988-07-01), Sato et al.
patent: 4812028 (1989-03-01), Matsumoto
patent: 4861148 (1989-08-01), Sato et al.
patent: 4953960 (1990-09-01), Williamson
patent: 5052763 (1991-10-01), Singh et al.
patent: 5592329 (1997-01-01), Ishiyama et al.
patent: 5636066 (1997-06-01), Takahashi
patent: 5650877 (1997-07-01), Phillips, Jr. et al.
patent: 5668673 (1997-09-01), Suenaga et al.
patent: 5686728 (1997-11-01), Shafer
patent: 5691802 (1997-11-01), Takahashi
patent: 5815310 (1998-09-01), Williamson
patent: 6172825 (2001-01-01), Takahashi
patent: 6199991 (2001-03-01), Braat
patent: 6213610 (2001-04-01), Takahashi et al.
patent: 6262836 (2001-07-01), Hudyma et al.
patent: 6302548 (2001-10-01), Takahashi et al.
patent: 6600608 (2003-07-01), Shafer et al.
patent: 6636350 (2003-10-01), Shafer et al.
patent: 2001/0002155 (2001-05-01), Takahashi et al.
patent: 2001/0043391 (2001-11-01), Shafer et al.
patent: 2002/0024741 (2002-02-01), Terasawa et al.
patent: 2002/0154395 (2002-10-01), Mann et al.
patent: 2003/0011755 (2003-01-01), Omura et al.
patent: 2003/0197922 (2003-10-01), Hudyma
patent: 2005/0088761 (2005-04-01), Terasawa et al.
patent: 0 828 172 (1998-03-01), None
patent: 1 069 448 (2001-01-01), None
patent: 51-149922 (1976-12-01), None
patent: 53-41079 (1978-04-01), None
patent: 61-149922 (1986-07-01), None
patent: 62-210415 (1987-09-01), None
patent: 62-258414 (1987-11-01), None
patent: 63-163319 (1988-07-01), None
patent: 2-66510 (1990-03-01), None
patent: 3-282527 (1991-12-01), None
patent: 4-234722 (1992-08-01), None
patent: 5-188298 (1993-07-01), None
patent: 6-230287 (1994-08-01), None
patent: 8-304705 (1996-11-01), None
patent: 9-211332 (1997-08-01), None
patent: 10-79345 (1998-03-01), None
patent: 10-90602 (1998-04-01), None
patent: 2000-98228 (2000-04-01), None
patent: 2000-100694 (2000-04-01), None
patent: 2001-27727 (2001-01-01), None
patent: 2001-166210 (2001-06-01), None
Ishii Hiroyuki
Kato Takashi
Terasawa Chiaki
Canon Kabushiki Kaisha
Schwartz Jordan M.
LandOfFree
Projection optical system and projection exposure apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Projection optical system and projection exposure apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Projection optical system and projection exposure apparatus will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3755363