Projection optical system and projection exposure apparatus

Details Projection optical system and projection exposure apparatus Projection optical system and projection exposure apparatus

1997-09-11

1999-08-24

Sugarman, Scott J.

Optical: systems and elements

Lens

Multiple component lenses

359663, 359784, G02B 900, G02B 912, G02B 1322

Patent

active

059431725

ABSTRACT:
In the projection optical system that projects an image of the first object onto the second object with a fixed reduction ratio and a projection aligner equipped therewith, said projection optical system comprises, viewed from said first object side, in order of succession, the first group of lenses with positive refractive power, and the second group of lenses virtually consists of afocal system, and the third group of lens with positive refractive power, and if the focal length of said projection optical system is represented by F, the projection magnification ratio of said projection optical system is represented by B, the distance between said first object and said second object is represented by L, the distance from said first object to the lens surface that is closest to said first group of lenses is represented by d.sub.0, the focal length of said first group of lenses is represented by f.sub.1, and the focal length of said third group of lenses is represented by f.sub.3 herein, then the following conditions should be satisfied:

REFERENCES:
patent: 3504961 (1970-04-01), Hoogland et al.
patent: 3897138 (1975-07-01), Kano
patent: 4666273 (1987-05-01), Shimizu et al.
patent: 4770477 (1988-09-01), Shafer
patent: 4772107 (1988-09-01), Friedman
patent: 4811055 (1989-03-01), Hirose
patent: 4891663 (1990-01-01), Hirose
patent: 4948238 (1990-08-01), Araki et al.
patent: 4977426 (1990-12-01), Hirose
patent: 5105075 (1992-04-01), Ohta et al.
patent: 5170207 (1992-12-01), Tezuka et al.
patent: 5260832 (1993-11-01), Togino et al.
Braat, Joseph "Optical microlithograhic technology for integrated circuit fabrication and inspection," SPIE, pp. 22-30 (SPIE, vol. 811, Apr. 2-3, 1987, The Hague, Netherlands).

Affiliated with

Also associated with

Rating

Projection optical system and projection exposure apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Projection optical system and projection exposure apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Projection optical system and projection exposure apparatus will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-472447