Projection optical system and method for photolithography...

Details Projection optical system and method for photolithography... Projection optical system and method for photolithography...

2007-10-19

2009-11-17

Hasan, Mohammed (Department: 2873)

Optical: systems and elements

Lens

With field curvature shaping

C359S726000

Reexamination Certificate

active

07619827

ABSTRACT:
A projection lens of a microlithographic projection exposure apparatus includes a final lens element and a terminating element having no overall refractive power that is positioned between, but spaced apart from, the final lens element and an image plane of the projection lens. The image plane is adjustably positioned such that a position of the image plane with respect to the final lens element is adjustable.

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