Projection optical system and method for photolithography...

Details Projection optical system and method for photolithography... Projection optical system and method for photolithography...

2007-10-18

2009-10-27

Hasan, Mohammed (Department: 2873)

Optical: systems and elements

Lens

With field curvature shaping

C359S665000

Reexamination Certificate

active

07609455

ABSTRACT:
A lithographic projection apparatus is arranged to project a pattern from a patterning device onto a substrate using a projection system and has a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid. An element of the projection system through which the pattern is projected has, on a surface configured to be in contact with the liquid, a protective coating which is SiO2.

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