Optical: systems and elements – Lens – Fluid
Reexamination Certificate
2007-10-18
2009-08-25
Hasan, Mohammed (Department: 2873)
Optical: systems and elements
Lens
Fluid
C359S649000, C359S726000
Reexamination Certificate
active
07580197
ABSTRACT:
A liquid immersion optical system includes a first optically transparent member and a second optically transparent member, arranged in an optical path between the first optically transparent member and an object. A first space between the first optically transparent member and the second optically transparent member is fillable with a first liquid. A second space between the second optically transparent member and the object is fillable with a second liquid. The second optically transparent member is detachably arranged in the optical path between the first optically transparent member and the object.
REFERENCES:
patent: 4346164 (1982-08-01), Tabarelli et al.
patent: 4480910 (1984-11-01), Takanashi et al.
patent: 4509852 (1985-04-01), Tabarelli et al.
patent: 5121256 (1992-06-01), Corle et al.
patent: 5610683 (1997-03-01), Takahashi
patent: 5825043 (1998-10-01), Suwa
patent: 5852490 (1998-12-01), Matsuyama
patent: 5900354 (1999-05-01), Batchelder
patent: 6020964 (2000-02-01), Loopstra et al.
patent: 6166865 (2000-12-01), Matsuyama
patent: 6191429 (2001-02-01), Suwa
patent: 6198576 (2001-03-01), Matsuyama
patent: 6961186 (2005-11-01), Pierrat et al.
patent: 7317507 (2008-01-01), Straaijer
patent: 7414794 (2008-08-01), Novak
patent: 2001/0040722 (2001-11-01), Shafer et al.
patent: 2003/0004757 (2003-01-01), Haines
patent: 2003/0011755 (2003-01-01), Omura et al.
patent: 2003/0030916 (2003-02-01), Suenaga
patent: 2003/0174408 (2003-09-01), Rostalski et al.
patent: 2005/0018164 (2005-01-01), Hansen
patent: 2005/0068499 (2005-03-01), Dodoc et al.
patent: 2005/0094119 (2005-05-01), Loopstra et al.
patent: 2006/0028630 (2006-02-01), Akimoto
patent: 221 563 (1985-04-01), None
patent: 224 448 (1985-07-01), None
patent: 0 023 231 (1981-02-01), None
patent: 0 605 103 (1994-07-01), None
patent: 0 834 773 (1998-04-01), None
patent: A-2002-244035 (2002-08-01), None
patent: WO 99/49504 (1999-09-01), None
patent: WO 03/077037 (2003-09-01), None
patent: WO 2004/107048 (2004-12-01), None
Kawata et al; “Fabrication of 0.2 μm Fine Patterns Using Optical Projection Lithography with an Oil Immersion Lens”; Jpn. J. Appl. Phys. vol. 31 (1992) pp. 4174-4177; Part 1, No. 128, Dec. 1992.
Feuer et al; “Projection Photolithography-Liftoff Techniques for Production of 0.2 μm Metal Patterns”; IEEE Transactions On Electron Devices, vol. 28, No. 11, pp. 1375-1378, Nov. 1981.
Baek et al; “Simulation Study of Process Latitude for Liquid Immersion Lithography”; Optical Microlithography XVI, vol. 5040 (2003), pp. 1620-1630.
Hafeman et al; “Simulation of imaging and stray light effects in immersion lithography”; Optical Microlithography XVI, vol. 5040 (2003), pp. 700-712.
Kawata et al; “Optical Projection Lithography Using Lenses with Numerical Apertures Great than Unity”; Microelectronic Engineering 9 (1989), pp. 31-36.
Owa et al; “Immersion Lithography; its potential performance and issues”; Optical Microlithography XVI, vol. 5040 (2003), pp. 724-733.
Owen et al; “1/8 μm optical lithography”; J. Vac. Sci. Technol. B 10(6), Nov./Dec. 1992, pp. 3032-3036
Smith et al; “Water Immersion Optical Lithography for the 45nm Node”; Optical Microlithography XVI, vol. 5040 (2003), pp. 679-689.
Switkes et al; “Resolution enhancement of 157 nm lithography by liquid immersion”; JM31(3), Oct. 2002, pp. 225-228.
Ulrich et al; “The Development of Dioptric Projection Lenses for DUV Lithography”; International Optical Design Conference 2002, vol. 4832 (2002), pp. 158-169.
Ikezawa Hironori
Omura Yasuhiro
Hasan Mohammed
Nikon Corporation
Oliff & Berridg,e PLC
LandOfFree
Projection optical system and method for photolithography... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Projection optical system and method for photolithography..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Projection optical system and method for photolithography... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4065458