Optical: systems and elements – Lens – With variable magnification
Patent
1999-05-19
2000-12-26
Epps, Georgia
Optical: systems and elements
Lens
With variable magnification
359691, 359295, 355 53, G02B 1514
Patent
active
061668656
ABSTRACT:
A projection optical system for projecting an image of a reticle onto a wafer wherein the first optical element in the projection optical system is a deformable mirror. The deformable mirror deforms into a surface having an aspherical shape. The projection optical system has a reduction ratio in the range of -1/8X to -1/20X.
REFERENCES:
patent: 5142132 (1992-08-01), MacDonald et al.
patent: 5451479 (1995-09-01), Ishibashi
patent: 5793473 (1998-08-01), Koyama et al.
patent: 5892597 (1999-04-01), Iwata et al.
Epps Georgia
Nikon Corporation
Thompson Timothy
LandOfFree
Projection optical system and exposure apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Projection optical system and exposure apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Projection optical system and exposure apparatus will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1001577