Projection optical system and exposure apparatus

Details Projection optical system and exposure apparatus Projection optical system and exposure apparatus

1999-05-19

2000-12-26

Epps, Georgia

Optical: systems and elements

Lens

With variable magnification

359691, 359295, 355 53, G02B 1514

Patent

active

061668656

ABSTRACT:
A projection optical system for projecting an image of a reticle onto a wafer wherein the first optical element in the projection optical system is a deformable mirror. The deformable mirror deforms into a surface having an aspherical shape. The projection optical system has a reduction ratio in the range of -1/8X to -1/20X.

REFERENCES:
patent: 5142132 (1992-08-01), MacDonald et al.
patent: 5451479 (1995-09-01), Ishibashi
patent: 5793473 (1998-08-01), Koyama et al.
patent: 5892597 (1999-04-01), Iwata et al.

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