Projection optical system adjustment method, prediction...

Details Projection optical system adjustment method, prediction... Projection optical system adjustment method, prediction...

2006-09-05

2006-09-05

Nguyen, Henry Hung (Department: 2851)

Photocopying

Projection printing and copying cameras

Focus or magnification control

C355S053000, C355S077000

Reexamination Certificate

active

07102731

ABSTRACT:
Wavefront aberration of a projection optical system is measured and information on the wavefront aberration is obtained (step102). Furthermore, a pattern of a reticle is transferred onto a wafer via a projection optical system (steps104to108). Then, the waver on which the pattern is transferred is developed, and line width measurement is performed on the resist image formed on the wafer and line width difference of images of a first line pattern extending in a predetermined direction and a second line pattern that is orthogonal to the first line pattern is measured (steps112to118). And, according to a value of the 12thterm of the Zernike polynomial, which is an expansion of the wavefront aberration, and the line width difference, the projection optical system is adjusted so that magnitude of the 9thterm (a low order spherical aberration term) is controlled (steps120to124).

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