Projection optical system, a projection exposure apparatus...

Photocopying – Projection printing and copying cameras – Step and repeat

Reexamination Certificate

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C355S055000, C359S683000

Reexamination Certificate

active

06947121

ABSTRACT:
The present invention is directed toward a high performance yet compact projection optical system that is both-sidedly telecentric, has the ability to minimize the reduction of image formation performance that occurs due to the absorption by the glass material used, can secure a sufficiently large numerical aperture and a broad exposure area, and has the ability to very favorably correct aberrations and especially distortion. In a projection optical system that projects a pattern of a first object onto a second object, comprising in order from the first object side, a positive first lens group, a negative second lens group, a positive third lens group, a negative fourth lens group, and positive fifth lens group that provides at least 2 negative lens compositions, and where the fifth lens group includes two lens planes that satisfy the expression φ/φexp≦3.5, and a first lens composition L59constituted of a first material that satisfies the expression n≦1.57, and where the entire projection optical system described above has two lens planes that satisfy the expression φ/φexp>3.5, and which includes a second lens composition L34constituted of a second material that satisfies the expression n>1.57.

REFERENCES:
patent: 4498742 (1985-02-01), Uehara
patent: 4734746 (1988-03-01), Ushida et al.
patent: 5194893 (1993-03-01), Nishi
patent: 5260832 (1993-11-01), Togino et al.
patent: 5345292 (1994-09-01), Shiozawa et al.
patent: 5359388 (1994-10-01), Hollman
patent: 5448336 (1995-09-01), Shiraishi
patent: 5473410 (1995-12-01), Nishi
patent: 5477304 (1995-12-01), Nishi
patent: 5530518 (1996-06-01), Ushida et al.
patent: 5646715 (1997-07-01), Wangler
patent: 5668672 (1997-09-01), Oomura
patent: 5675401 (1997-10-01), Wangler et al.
patent: 5691802 (1997-11-01), Takahashi
patent: 5781278 (1998-07-01), Matsuzawa et al.
patent: 5835285 (1998-11-01), Matsuzawa et al.
patent: 5854671 (1998-12-01), Nishi
patent: 5903400 (1999-05-01), Endo
patent: 5930049 (1999-07-01), Suenaga et al.
patent: 5990926 (1999-11-01), Mercado
patent: 6084723 (2000-07-01), Matsuzawa et al.
patent: 6118516 (2000-09-01), Irie et al.
patent: 6259508 (2001-07-01), Shigematsu
patent: 6683729 (2004-01-01), Schuster
Nikon's news release entitled “Ordering to Start for Nikon's New Step-and-Repeat Exposure System NSR-SF100”; dated Nov. 29, 1999.

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